The Nyquist criterion and its applicability in phase-stepping digital shearography

Kazi Monowar Abedin*, Awatef Rashid Al Jabri, S. M. Mujibur Rahman

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Phase-stepping shearography is a useful speckle interferometric technique having wide applicability in various fields. Nyquist criterion has long been considered to be the gold standard in signal processing and imaging. This criterion states that the spatial frequency of image sampling should be more than twice the maximum spatial frequency in the image. As applied to speckle imaging in shearography, this implies that, if a two-dimensional charge-coupled device (CCD) is used for imaging, the pixel separation of the CCD device should be half of the minimum feature size in the image, or half of the speckle size. We examined the applicability of the Nyquist criterion in image sampling in phase-stepping shearography. We used a shearographic system employing a 24-megapixel digital still camera and a Michelson interferometer based shearing arrangement. We generated phase maps from a deformed object, which was a center-loaded thin aluminum plate fixed at the periphery. For a given amount of deformation and image shear, detailed phase maps where generated using the 4+4 phase stepping protocol for a different F-numbers, representing different sampling situations, ranging from the sub-Nyquist domain (undersampling) through the Nyquist domain, to the above-Nyquist (oversampling) domain. From the generated phase maps and quantitative measurements, we show that adherence to the Nyquist criterion is not a strict requirement in digital shearography. Operation in the sub-Nyquist domain is acceptable, even desirable, in many cases. Phase maps of good contrast and quality, with or without filtering, can be generated in the sub-Nyquist domain, which can be useful in strain analysis and non-destructive testing applications.

Original languageEnglish
Title of host publicationOptical Measurement Systems for Industrial Inspection XIII
EditorsPeter Lehmann
PublisherSPIE
ISBN (Electronic)9781510664456
DOIs
Publication statusPublished - Aug 15 2023
EventOptical Measurement Systems for Industrial Inspection XIII 2023 - Munich, Germany
Duration: Jun 26 2023Jun 29 2023

Publication series

NameOptical Measurement Systems for Industrial Inspection XIII

Conference

ConferenceOptical Measurement Systems for Industrial Inspection XIII 2023
Country/TerritoryGermany
CityMunich
Period6/26/236/29/23

Keywords

  • Nyquist criterion
  • digital imaging
  • digital shearography
  • phase map
  • phase-stepping
  • speckle techniques

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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