Novel planarizing scheme for patterned media

Wei Choong Allen Poh, Hang Khume Tan, Lay Ting Ong, Hui Kim Hui, Seng Kai Wong, Kyaw Oo Aung, Eileen Tan, Rachid Sbiaa, Yew Seng Kay, S. N. Piramanayagam

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)


A novel planarization scheme, consisting of compression of a low glass transition temperature (Tg) and low viscosity poly(methyl methacrylate) (PMMA) polymer into grooves of patterned recording media using a surface with flat morphology, has been proposed and investigated. Si (100) surface was used as the smooth surface for pressing PMMA onto the patterned media. Patterned samples prepared with such a planarization method showed very smooth topography of roughness as small as 3 Å (which is comparable to present hard disk media based on continuous film) by atomic force microscope. A magnetic sacrificial layer is proposed in addition as a solution to etching or polishing issues.

Original languageEnglish
Pages (from-to)806-808
Number of pages3
JournalJournal of Vacuum Science and Technology B
Issue number4
Publication statusPublished - 2010

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Instrumentation
  • Process Chemistry and Technology
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering
  • Materials Chemistry


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