Novel planarizing scheme for patterned media

Wei Choong Allen Poh; Hang Khume Tan; Lay Ting Ong; Hui Kim Hui; Seng Kai Wong; Kyaw Oo Aung; Eileen Tan; Rachid Sbiaa; Yew Seng Kay; S. N. Piramanayagam

doi:10.1116/1.3455497

Novel planarizing scheme for patterned media

Wei Choong Allen Poh, Hang Khume Tan, Lay Ting Ong, Hui Kim Hui, Seng Kai Wong, Kyaw Oo Aung, Eileen Tan, Rachid Sbiaa, Yew Seng Kay, S. N. Piramanayagam

Physics

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

A novel planarization scheme, consisting of compression of a low glass transition temperature (T_g) and low viscosity poly(methyl methacrylate) (PMMA) polymer into grooves of patterned recording media using a surface with flat morphology, has been proposed and investigated. Si (100) surface was used as the smooth surface for pressing PMMA onto the patterned media. Patterned samples prepared with such a planarization method showed very smooth topography of roughness as small as 3 Å (which is comparable to present hard disk media based on continuous film) by atomic force microscope. A magnetic sacrificial layer is proposed in addition as a solution to etching or polishing issues.

Original language	English
Pages (from-to)	806-808
Number of pages	3
Journal	Journal of Vacuum Science and Technology B
Volume	28
Issue number	4
DOIs	https://doi.org/10.1116/1.3455497
Publication status	Published - 2010

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Instrumentation
Process Chemistry and Technology
Surfaces, Coatings and Films
Electrical and Electronic Engineering
Materials Chemistry

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T1 - Novel planarizing scheme for patterned media

AU - Poh, Wei Choong Allen

AU - Tan, Hang Khume

AU - Ong, Lay Ting

AU - Hui, Hui Kim

AU - Wong, Seng Kai

AU - Aung, Kyaw Oo

AU - Tan, Eileen

AU - Sbiaa, Rachid

AU - Kay, Yew Seng

AU - Piramanayagam, S. N.

PY - 2010

Y1 - 2010

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AB - A novel planarization scheme, consisting of compression of a low glass transition temperature (Tg) and low viscosity poly(methyl methacrylate) (PMMA) polymer into grooves of patterned recording media using a surface with flat morphology, has been proposed and investigated. Si (100) surface was used as the smooth surface for pressing PMMA onto the patterned media. Patterned samples prepared with such a planarization method showed very smooth topography of roughness as small as 3 Å (which is comparable to present hard disk media based on continuous film) by atomic force microscope. A magnetic sacrificial layer is proposed in addition as a solution to etching or polishing issues.

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Novel planarizing scheme for patterned media

Abstract

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